Accurate Cras, protegens hyacintho caelum - Zetron Technology scriptor Odor Cras System Leads novum trend of environmental praesidium

In fluctus et celeri oeconomica progressionem, variis pollutio fontes non exorta sunt, praesertim petrochemical, industriae et aer-related conatibus. Dum promovens oeconomica incrementum, etiam imposuit gravi onus in environment. Diversitas pollutio formae et multiplicitate adipiscing damnum fecisse environmental onus permanere consurgere et environmental pollutio accidentibus occurrit frequenter, attrahentis publicae publicam operam. Inter eos, odorem pollutio est momenti factor afficiens environmental qualis, et ejus effective magna et imperium sunt etiam magis urgente. Et eius outstanding R & D vires et profunda professional background, Zetron technology habet diligenter aedificavit Th-MM-seu Odor Cras System, quod praebet fortis scientific et technological firmamentum hoc problema praebet.

Ut in environmental magna solution provisor, Zetron technology providet provecta odor vigilantia systems et customized systematis suggestfs pro project in praeter comprehensive technica, et ad profectum technica, et apparatu et scientificis solvere odorem problems.

I. Project background

Testing Requirements:

Project Name: environmental Cras facilius Procurement Project of *** Comitatus Industrial Park Construction et Development Co., Ltd.

Purchasing Unit: *** Comitatus Industrial Park Construction et Development Co., Ltd.

Parameter Requirements:

Plus quam a dozen odorem adipiscing systems (toxicus et nocivis vapores + meteorology) sunt requiritur. Diversis generis toxicus et nocivis gasorum non requiritur secundum diversas installation puncta.

Installation Point I: 

NH3: 0-50mg / M3, 0.01mg / M3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point II:

HF: 0-10mg / M3 0.01 MG / M3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point III:

Ch4o: 0-10 mg / m3, 0.01 mg / m3

Hydrogenium Chloride HCL: 0-10 mg / m3, 0.01mg / m3

Xylene C8H10: 0-10 mg / m3, 0.01mg / m3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point IV:

Non-Methane totalis hydrocarbons nmhc: 0-10mg / m3, 0.01 mg / m3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

II. Solutio

Th-MM-seu Odor Cras System commendatur, instructa diversis Gas sensoriis ad deprehendere diversis vapores + meteorological sensoriis.

III. Quid products sunt matched

Installation Point I, th-MM-ou

Deprehensio Factor: NH3: 0-50MG / M3, 0.01mg / M3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point II: Th-MM-ou

Deprehensio Factor: HF, 0-10mg / M3 0.01 MG / M3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point III, th-MM-ou

Deprehensio Factor: Methanol Ch4o: 0-10 mg / m3, 0.01 mg / m3

Hydrogenium Chloride HCL: 0-10 mg / m3, 0.01mg / m3

Xylene C8H10: 0-10 mg / m3, 0.01mg / m3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

Installation Point quattuor: th-MM-ou

Deprehensio Factor: Non-Methane Summa Hydrocarbons NMHC: 0-10mg / M3, 0.01 MG / M3

Ventus SPEED E: 0-30 M / S 0,1 M / S

Ventus Direction WD: 0-360 °

Aeris pressura: XXX ~ 120KPA 1KPA

IV. De-site imaginibus

Cum suam innovative technica commoda, practica muneris characteres et comprehensive servitium ratio, th-MM-seu Odor Cras System Zetron technology habet effectum a major breakthrough in agro de environmental tutela technology. Est potens instrumentum promovere continuam emendationem patriae aere qualitas et protegat hyacintho caelum et albo nubibus.

Eligens Th-MM-seu Odor Cras System Zetron technology significat eligens professionalem, efficient et certa environmental magna ministerium. Contribuere scientific et technological vires ad constructionem pulchra Sinis.